ICP-AES / ICP-OES analysis laboratory
Would you like to carry out an ICP-AES / ICP-OES analysis
What is ICP-AES / ICP-OES analysis?
ICP-AES / ICP-OES are inductively coupled plasma analytical techniques coupled with Atomic Emission Spectrometers.
These detectors measure the wavelength of the ions emitted. The combination of ICP-AES and ICP-MS makes it possible to determine a wide range of inorganic elements or elemental impurities.
ICP AES analysis: industrial standards and complex matrices
L’ICP-AES est une méthode d’analyse élémentaire par spectrométrie d’émission atomique. Elle permet de mesurer avec précision la teneur en métaux et autres éléments dans une grande variété de matrices, qu’elles soient liquides, solides ou en solution.
Why choose ICP-AES?
This term remains the historical benchmark in many official protocols and international standards (ISO, ASTM). The FILAB laboratory uses ICP-AES for the characterization of heavy industrial materials, the analysis of metal alloys, or environmental compliance testing on complex matrices. This approach guarantees excellent reproducibility for routine analysis and quality control of your raw materials.
ICP OES analysis: focus on ultra-traces and regulated sectors
Also called ICP-OES for Optical Emission Spectrometry, this technique is based on the same principle as ICP-AES. It is used for fast and reliable multi-element analysis, especially when high precision is required at the trace level, in fields such as metallurgy, pharmaceuticals, cosmetics, or the environment.
The advantages of next-generation ICP-OES
FILAB deploys ICP-OES to meet the strict requirements of advanced industries (method validation according to the European Pharmacopoeia or USP, elemental impurity screening ICH Q3D). Thanks to an advanced optical configuration, we isolate complex spectral interferences to quantify ultra-traces with absolute reliability.
Why use ICP-AES / ICP-OES?
In industry, mastering elemental composition is essential at several stages:
Raw material inspection
Detection of metallic impurities
Compliance validation
Process monitoring
ICP-AES / OES is preferred when it comes to meeting strict regulatory requirements (ISO, ICH Q3D, USP, etc.), avoiding quality or safety risks, or optimizing complex formulations. It is a precise analytical response to challenges of performance, traceability, and competitiveness.
The FILAB laboratory supports you in your analysis thanks to its ICP AES / ICP-OES expertise
FILAB is equipped with several ICP-AES / ICP-OES systems
Depuis plus de dix ans, le laboratoire FILAB a développé de nombreuses compétences en analyses chimiques et plus particulièrement en analyses ICP. Notre laboratoire dispose d’un parc analytique de pointe et des compétences humaines de haut niveau afin d’offrir à ses clients des services répondant à leurs besoins :
- Analyse ICP-AES et ICP-OES
- Analyse ICP MS ou ICP MS/MS
Our ICP-AES/ICP-OES analysis services
- Metals and alloys : determination of the content of major and trace elements in metals and alloys. For example, the analysis of steels, aluminum alloys, or superalloys used in aerospace.
- Polymer and composite materials : identification and quantification of additives and trace elements in plastics and composites
Pharmaceutical industry : analysis of raw materials and finished products to ensure compliance with specifications and regulations (for example, the detection of metallic contaminants).
- Chemical industry : monitoring the purity of chemicals and raw materials. Detection of impurities in acids, solvents, and other industrial chemicals.
- Semiconductor industry : monitoring metallic contaminants in materials used to manufacture electronic components
The objectives of ICP-OES analysis
Objectives of ICP OES / AES Analysis
Identify and quantify chemical elements present in a matrix (metals, metalloids, non-metals), whether major, minor, trace, or ultra-trace.
Monitor the composition of raw materials, finished products, or intermediates, to ensure compliance with technical or regulatory specifications (ISO standards, pharmacopoeias, environmental directives, etc.).
Detect the presence of metallic impurities or unwanted contaminants in sensitive formulations (pharmaceutical products, cosmetics, etc.).
Optimize and validate industrial processes through precise monitoring of chemical elements in production.
Support R&D in the development of new materials or products requiring detailed chemical characterization.
Nos expertises
Valider les protocoles selon les guidelines en vigueur
Transférer les méthodes dans vos laboratoires
Former vos équipes (sur place ou à distance)
FAQ
TheICP-OES measures the light emitted by excited atoms in the plasma, whileICP-MS measures their mass after ionization. ICP-OES is ideal for concentrations on the order ofppm, with excellent robustness on complex matrices.
ICP-MS, which is more sensitive, is used for ultra-trace levels (ppb to ppt), but it is also more sensitive to interferences. The choice therefore depends on the expected detection level and the type of matrix.
Typical detection limits vary depending on the elements and conditions, but generally range from 0.01 to 1 ppm. ICP-OES is therefore ideally suited for composition control, impurities with regulatory thresholds, or routine analysis requiring precision.
ICP-OES enables the analysis of more than 70 elements of the periodic table, including alkali metals, alkaline earth metals, transition metals, as well as certain non-metals such as phosphorus, sulfur, and silicon. This broad elemental coverage makes it a method of choice for multi-element analysis.
We analyze solid, liquid, or solution samples after preparation: alloys, powders, polymers, oils, water, pharmaceutical raw materials, cosmetic extracts, etc. Our laboratory adapts to your matrices, even complex ones.
Yes, depending on the nature of the sample, dissolution or acid digestion is required before injection into the plasma. Our laboratory adapts preparation protocols (mineralization, dilution, filtration, etc.) to ensure optimal measurement, even on complex matrices (metals, polymers, cosmetics, etc.).
ICP-AES or ICP OES analysis is particularly advantageous for industrial sectors requiring precise, rapid, multi-element elemental analysis, especiallypharmacy, metallurgy, and cosmetics.
It reliably quantifies traces of metals or light elements in a wide range of materials: metal alloys, polymers, glass, manufacturing residues, water, powders, or liquid formulations.
More sensitive than X-ray fluorescence for low concentrations, ICP-AES/OES is the ideal solution for meeting regulatory requirements (ICH Q3D, USP, REACH, etc.) and ensuring the quality, safety, and compliance of industrial products.
The combination of ICP-AES and ICP-MS makes it possible to determine a wide range of inorganic elements and elemental impurities in a single run, with extreme reliability and precision (from ppt to ppb depending on the matrices).
